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The LeBeau Group

Overview

As scaling continues to be a major drive of research, future developments rely upon electron microscopy to probe the nature of material properties. In the nano-regime, one must explore local atomic structure, chemical composition, and bonding with ultimate spatial resolution. Now that aberration corrected microscopes have blown past the Ångström in resolution, a new level of clarity is available for exploring next-generation materials.

Research Interests

  • Application of aberration-corrected electron microscopy
  • Understanding material properties from the atomic structure
  • Reconstruction at the interface between dissimilar materials
  • Quantitative atomic resolution microscopy imaging and diffraction
  • Three dimensional imaging of materials
  • Image processing and analysis techniques

People

James LeBeau - Associate Professor

His research interests focus on applying and developing transmission electron microscopy techniques to determine the atomic structure of material defects, thus providing insight into observed properties. This is of particular importance as electronic devices scale to ever vanishingly small dimensions, when the detailed arrangement of atoms at interfaces begins to critically influence material properties. He earned his BS in materials science & engineering in 2006 from Rensselaer Polytechnic Institute. He then went on to the University of California at Santa Barbara where he earned his PhD in 2010.

Houston Dycus - Postdoc

Publications

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